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Seungwoo Lee, Hong Suk Kang and Jung-Ki Park Directional Photofluidization Lithography: Micro/Nanostructural Evolution by Photofluidic Motions of Azobenzene Materials Advanced Materials 24

Version of Record online: 27 MAR 2012 | DOI: 10.1002/adma.201104826

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Directional photofluidization enables structural evolution toward high resolution with various shapes, unprecedented complexity, and lower edge-roughness by virtue of the reversible and directional motions of azo-materials (a path-changing approach). This reversible and fluidic evolution of micro/nanostructures provides both micro/nanostructural designs beyond those that can be achieved using established lithographic approaches and excellent motivation for novel photonic properties.

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