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Takashi Hisatomi, Hen Dotan, Morgan Stefik, Kevin Sivula, Avner Rothschild, Michaël Grätzel and Nripan Mathews Enhancement in the Performance of Ultrathin Hematite Photoanode for Water Splitting by an Oxide Underlayer Advanced Materials 24

Version of Record online: 17 APR 2012 | DOI: 10.1002/adma.201104868

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A 2-nm thick Nb2O5 underlayer deposited by atomic layer deposition increases the charge separation efficiency and the photovoltage of ultrathin hematite films by suppressing electron back injection. Absorbed photon-to-current efficiencies (APCE) as high as 40%, which are one of the highest ever reported with hematite photoanodes, are obtained at 400 nm at +1.43 V vs. RHE.

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