Christy D. Petruczok and Karen K. Gleason Initiated Chemical Vapor Deposition-Based Method for Patterning Polymer and Metal Microstructures on Curved Substrates Advanced Materials 24
A simple, efficient, and scalable method for patterning microstructures on curved substrates is demonstrated. Initiated chemical vapor deposition is used to synthesize a thin film that crosslinks upon UV exposure. Polymeric features are defined on glass rods with high curvature and used as masks for metal patterning. Additionally, vapor-deposited polymer layers are selectively patterned to produce bifunctional surfaces.
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