E-mail a Wiley Online Library Link

Christy D. Petruczok and Karen K. Gleason Initiated Chemical Vapor Deposition-Based Method for Patterning Polymer and Metal Microstructures on Curved Substrates Advanced Materials 24

Version of Record online: 26 SEP 2012 | DOI: 10.1002/adma.201201975

Thumbnail image of graphical abstract

A simple, efficient, and scalable method for patterning microstructures on curved substrates is demonstrated. Initiated chemical vapor deposition is used to synthesize a thin film that crosslinks upon UV exposure. Polymeric features are defined on glass rods with high curvature and used as masks for metal patterning. Additionally, vapor-deposited polymer layers are selectively patterned to produce bifunctional surfaces.

Complete the form below and we will send an e-mail message containing a link to the selected article on your behalf

Required = Required Field