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Seok Kim, Howon Jung, Yongwoo Kim, Jinhee Jang and Jae W. Hahn Resolution Limit in Plasmonic Lithography for Practical Applications beyond 2x-nm Half Pitch Advanced Materials 24

Version of Record online: 8 OCT 2012 | DOI: 10.1002/adma.201203604

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The ultimate resolution of plasmonic lithography using a ridge aperture is evaluated with a theoretical model. A circular contact probe with high positioning accuracy is fabricated to record high-density line array patterns with a half pitch of up to 22 nm. The model fits well with the pattern depth experimental results and predicts a resolution for plasmonic lithography to less than 10 nm.

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