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Rong Yang, Tonio Buonassisi and Karen K. Gleason Organic Vapor Passivation of Silicon at Room Temperature Advanced Materials 25

Version of Record online: 28 JAN 2013 | DOI: 10.1002/adma.201204382

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A simple, inexpensive, efficient, and scalable method to create air-stable organic surface passivation layers on silicon using a vapor-phase treatment is demonstrated. A variant of initiated chemical vapor deposition is used to synthesize a thin film that acts as both a passivation layer and an antireflective coating. The lowest surface recombination velocity reported to date is achieved and maintained during prolonged exposure to air.

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