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Matthias E. Bahlke, Hiroshi A. Mendoza, Daniel T. Ashall, Allen S. Yin and Marc A. Baldo Organic Semiconductors: Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO2 Resists (Adv. Mater. 46/2012) Advanced Materials 24

Article first published online: 29 NOV 2012 | DOI: 10.1002/adma.201290293

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Frozen carbon dioxide can be used as a phase-change resist to perform dry lithography of organic thin films, as shown by Matthias E. Bahlke and co-workers on page 6136. The resist sublimes closest to the surface, separating the still-solid resist that in turn lifts off undesired organic material. This new technique will help address the incompatibility of organic semiconductors with traditional photolithography.

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