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Weiyin Gu, Ji Xu, Jung-Keun Kim, Sung Woo Hong, Xinyu Wei, Xiaomin Yang, Kim Y. Lee, David S. Kuo, Shuaigang Xiao and Thomas P. Russell Solvent-Assisted Directed Self-Assembly of Spherical Microdomain Block Copolymers to High Areal Density Arrays Advanced Materials 25

Article first published online: 13 MAY 2013 | DOI: 10.1002/adma.201300899

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The fabrication process for 5 Tb/in2 bit patterns using solvent-assisted directed self-assembly is investigated. The N-methyl-2-pyrrolidone solvent vapor-annealing method was used to achieve good long-range lateral ordering of low-molecular-weight polystyrene-block-polydimethylsiloxane with a lattice spacing of 11 nm on flat Si substrates, PS modified substrates and lithographically patterned substrates, respectively.

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