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Erika Zanchetta, Gioia Della Giustina, Gianluca Grenci, Alessandro Pozzato, Massimo Tormen and Giovanna Brusatin Novel Hybrid Organic–Inorganic Spin-on Resist for Electron- or Photon-Based Nanolithography with Outstanding Resistance to Dry Etching Advanced Materials 25

Version of Record online: 5 AUG 2013 | DOI: 10.1002/adma.201301555

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A new spin-on alumina-based resist exhibits excellent performance in terms of both achievable lateral resolution and etch resistance in fluorine-based non-cryo-cooled dry etching processes. The resist has selectivity greater than 100:1 with respect to the underlying silicon during the etching process, patternability with various lithographic tools (UV, X-rays, electron beam, and nanoimprint lithography), and positive and negative tone behavior depending only on the developer chemistry.

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