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Weiyin Gu, Hui Zhao, Qingshuo Wei, E. Bryan Coughlin, Patrick Theato and Thomas P. Russell Line Patterns from Cylinder-Forming Photocleavable Block Copolymers Advanced Materials 25

Version of Record online: 19 JUL 2013 | DOI: 10.1002/adma.201301556

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A robust route for the preparation of nanoscopic line patterns from polystyrene-block-poly(ethylene oxide) featuring a photocleavable o-nitrobenzyl ester junction is demonstrated. After mild UV (λ = 365 nm) exposure and selective removal of the PEO microdomains, the polymer trench patterns are used as scaffold to fabricate highly ordered arrays of silica or Au line patterns.

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