E-mail

E-mail a Wiley Online Library Link

Weiyin Gu, Hui Zhao, Qingshuo Wei, E. Bryan Coughlin, Patrick Theato and Thomas P. Russell Line Patterns from Cylinder-Forming Photocleavable Block Copolymers Advanced Materials 25

Version of Record online: 19 JUL 2013 | DOI: 10.1002/adma.201301556

Thumbnail image of graphical abstract

A robust route for the preparation of nanoscopic line patterns from polystyrene-block-poly(ethylene oxide) featuring a photocleavable o-nitrobenzyl ester junction is demonstrated. After mild UV (λ = 365 nm) exposure and selective removal of the PEO microdomains, the polymer trench patterns are used as scaffold to fabricate highly ordered arrays of silica or Au line patterns.

Complete the form below and we will send an e-mail message containing a link to the selected article on your behalf

Required = Required Field

SEARCH