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Anna Maria Coclite, Rachel M. Howden, David C. Borrelli, Christy D. Petruczok, Rong Yang, Jose Luis Yagüe, Asli Ugur, Nan Chen, Sunghwan Lee, Won Jun Jo, Andong Liu, Xiaoxue Wang and Karen K. Gleason 25th Anniversary Article: CVD Polymers: A New Paradigm for Surface Modifi cation and Device Fabrication Advanced Materials 25

Version of Record online: 25 SEP 2013 | DOI: 10.1002/adma.201301878

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The deposition of functional polymers from the vapor phase enables new frontiers for device fabrication and technological development. Chemical vapor deposition (CVD) methods have a marked footprint in a wide range of applications from biotechnology to conducting polymers for solar cells. Finally, CVD process implementation to an industrial scale and commercialization are also discussed.

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