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Chao Yuan, Kaikai Jin, Kai Li, Shen Diao, Jiawei Tong and Qiang Fang Non-Porous Low-k Dielectric Films Based on a New Structural Amorphous Fluoropolymer Advanced Materials 25

Version of Record online: 15 JUL 2013 | DOI: 10.1002/adma.201302021

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A non-porous and amorphous fluoropolymer PFN with low dielectric constant of 2.33 and dielectric loss less than 1.2 × 10−3 is reported here. PFN also exhibits good mechanical properties and high thermostability. This study is a new example of a fully dense material showing a low k value and having good thermo/mechanical properties.

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