E-mail a Wiley Online Library Link

Rong Yang, Tonio Buonassisi and Karen K. Gleason Thin Films: Organic Vapor Passivation of Silicon at Room Temperature (Adv. Mater. 14/2013) Advanced Materials 25

Version of Record online: 8 APR 2013 | DOI: 10.1002/adma.201370092

Thumbnail image of graphical abstract

Initiated chemical vapor deposition is used to achieve air-stable organic passivation of silicon, as reported by Karen K. Gleason and co-workers on page 2078. This layer also functions as an anti-reflection coating. Resistively heated wires produce reactive gas phase species, including methyl radicals, while the silicon surface below remains near room temperature. Photoshop enhanced image by Felice C. Frankel.

Complete the form below and we will send an e-mail message containing a link to the selected article on your behalf

Required = Required Field