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Rong Yang, Tonio Buonassisi and Karen K. Gleason Thin Films: Organic Vapor Passivation of Silicon at Room Temperature (Adv. Mater. 14/2013) Advanced Materials 25

Version of Record online: 8 APR 2013 | DOI: 10.1002/adma.201370092

Thumbnail image of graphical abstract

Initiated chemical vapor deposition is used to achieve air-stable organic passivation of silicon, as reported by Karen K. Gleason and co-workers on page 2078. This layer also functions as an anti-reflection coating. Resistively heated wires produce reactive gas phase species, including methyl radicals, while the silicon surface below remains near room temperature. Photoshop enhanced image by Felice C. Frankel.

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