E-mail

E-mail a Wiley Online Library Link

Luis García-Fernández, Cyril Herbivo, Verónica San Miguel Arranz, David Warther, Loïc Donato, Alexandre Specht and Aránzazu del Campo Dual Photosensitive Polymers with Wavelength-Selective Photoresponse Advanced Materials 26

Version of Record online: 15 MAY 2014 | DOI: 10.1002/adma.201401290

Thumbnail image of graphical abstract

Polyurethane thin films that photopolymerize and photodegrade upon exposure to light of different wavelengths are presented. The chromic response is based on two caged monomers with the ability to be activated or photocleaved with different wavelengths under single and two-photon excitation. This material represents a dual photoresist with “positive” and “negative” tone contained in a single resist formulation and with the ability to generate complex 2D and 3D patterns.

Complete the form below and we will send an e-mail message containing a link to the selected article on your behalf

Required = Required Field

SEARCH