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Sai Bai, Motao Cao, Yizheng Jin, Xinliang Dai, Xiaoyong Liang, Zhizhen Ye, Min Li, Jipeng Cheng, Xuezhang Xiao, Zhongwei Wu, Zhouhui Xia, Baoquan Sun, Ergang Wang, Yueqi Mo, Feng Gao and Fengling Zhang Low-Temperature Combustion-Synthesized Nickel Oxide Thin Films as Hole-Transport Interlayers for Solution-Processed Optoelectronic Devices Advanced Energy Materials 4

Version of Record online: 19 NOV 2013 | DOI: 10.1002/aenm.201301460

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A method to deposit NiOx thin films by employing combustion reactions is reported and a low processing temperature of 175 °C is demonstrated. The resulting NiOx films exhibit high work functions, excellent optical transparency, and flat surface features. The NiOx thin films are employed as hole-transport interlayers in organic solar cells and polymer light-emitting diodes, exhibiting superior electrical properties.

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