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Dr. Jürgen Hüpkes, Dr. Jorj I. Owen, Dr. Sascha E. Pust and Dr. Eerke Bunte  Chemical Etching of Zinc Oxide for Thin-Film Silicon Solar Cells ChemPhysChem 13

Version of Record online: 8 DEC 2011 | DOI: 10.1002/cphc.201100738

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Chemical etching is widely applied to texture the surface of sputter-deposited zinc oxide for light scattering in thin-film silicon solar cells. Based on experimental findings from the literature and our own results we propose a model that explains the etching behavior of ZnO depending on the structural material properties and the etching agent (see picture).

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