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Ohad Goldbart, Dr. Alexander Yoffe, Dr. Sidney R. Cohen, Dr. Rita Rosentsveig, Dr. Yishay Feldman, Prof. Lev Rapoport and Prof. Reshef Tenne New Deposition Technique for Metal Films Containing Inorganic Fullerene-Like (IF) Nanoparticles ChemPhysChem 14

Article first published online: 6 MAY 2013 | DOI: 10.1002/cphc.201201003

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A new method for fabrication of thin composite films using physical vapor deposition (PVD) is described. Titanium (Ti) and hybrid films of titanium containing tungsten disulphide nanoparticles with inorganic fullerene-like structure (Ti/IF-WS2) are fabricated (see picture). The Ti/IF-WS2 shows better wear resistance and a lower friction coefficient when compared to the Ti layer or Ti substrate.

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