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Dr. Caroline E. Knapp, Iasson D. Prassides, Dr. Sanjayan Sathasivam, Prof. Ivan P. Parkin and Prof. Claire J. Carmalt Aerosol-Assisted Chemical Vapour Deposition of a Copper Gallium Oxide Spinel ChemPlusChem 79

Version of Record online: 24 NOV 2013 | DOI: 10.1002/cplu.201300289

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Having a gas: Copper-based spinel oxide films have been deposited by means of a simple one-pot solution-based aerosol-assisted chemical vapour deposition (AACVD) method. AACVD of copper(II) 2,2,6,6,-tetramethylheptan-3,5-dionate and gallium(III) acetylacetonate (acac) in toluene resulted in the formation of CuGa2O4 films along with copper(I) oxide (Ga2O3 at the surface of the film; see scheme). Annealing the films resulted in oxidation and formation of CuGa2O4 and copper(II) oxide.

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