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Do Han Kim, Mariah Woodroof, Kyoungmi Lee and Prof. Gregory N. Parsons Atomic Layer Deposition of High Performance Ultrathin TiO2 Blocking Layers for Dye-Sensitized Solar Cells ChemSusChem 6

Article first published online: 29 MAY 2013 | DOI: 10.1002/cssc.201300067

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Plugging the hole: Atomic layer deposition (ALD) produces ultrathin (<10 nm) blocking layers (BLs) that significantly impede charge recombination in functional dye-sensitized solar cells (DSSCs). This leads to improved photocurrents, open-circuit photovoltages, and fill factors, which increase the overall efficiency from ≈7 % to ≈8.4 % under AM 1.5 G illumination. The 5–10 nm ALD BLs are the thinnest optimized DSSC BLs reported to date.

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