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Do Han Kim, Mariah Woodroof, Kyoungmi Lee and Prof. Gregory N. Parsons Cover Picture: Atomic Layer Deposition of High Performance Ultrathin TiO2 Blocking Layers for Dye-Sensitized Solar Cells (ChemSusChem 6/2013) ChemSusChem 6

Version of Record online: 3 JUN 2013 | DOI: 10.1002/cssc.201390023

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The Cover Image shows the sequential dosing and purging of TiCl4 and H2O in atomic layer deposition (ALD) through step-like pressure changes in an effort to saturate the surface of fluorine doped tin oxide (FTO) glass with each reactant. These ultra-thin and uniform ALD TiO2 films with thicknesses of only 5 nm form a blocking layer on the rough FTO surface to be used in dye-sensitized solar cells (see the report by Kim et al. on page 1014) as the yallow photogenerated electrons to move to the FTO side effectively, thus inhibiting the recombination with holes at the FTO/electrolyte interface.

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