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Nikos Peltekis, Marcel Mausser, Shishir Kumar, Niall McEvoy, Chris Murray and Georg S. Duesberg Remote Plasma-Assisted CVD Growth of Carbon Nanotubes in an Optimised Rapid Thermal Reactor Chemical Vapor Deposition 18

Version of Record online: 6 MAR 2012 | DOI: 10.1002/cvde.201106925

The growth of both MWNTs and SWNTs by remote plasma assisted CVD in a purpose built rapid ramping reactor is presented. The reactor allows for highly reproducible growth, with uniform temperature and plasma conditions and fast sample exchange. The SWNTs grown are of a very high purity and have a repeatable distribution of small diameters. Further, growth of dense aligned MWNT forests on conducting substrates is demonstrated.

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