David E. Cassidy and William J. DeSisto Atomic Layer Deposition-Modified Ordered Mesoporous Silica Membranes Chemical Vapor Deposition 18
Ordered mesoporous silica membranes of 4 nm nominal pore diameter were modified by aluminum oxide ALD. Detailed characterization at different stages of modification indicated that deposition efficiency reduced as pore size decreased. ALD is a promising tool for membrane synthesis.
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