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Han-Bo-Ram Lee, Yong Jun Park, Sunggi Baik and Hyungjun Kim Initial Stage Growth during Plasma-Enhanced Atomic Layer Deposition of Cobalt Chemical Vapor Deposition 18

Version of Record online: 5 MAR 2012 | DOI: 10.1002/cvde.201106937

The initial growth of Co thin films during plasma enhanced atomic layer deposition by using Co metal organic precursor and NH3 plasma counter reactant was investigated by atomic force microscopy, scanning electron microscopy, and synchrotron radiation X-ray reflectivity. The growth behavior of Co was explained by island growth of Co under substrate-inhibited growth mode.

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