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Peter-Paul R. M. L. Harks, Z. Silvester Houweling, Michiel de Jong, Yinghuan Kuang, John W. Geus and Ruud E. I. Schropp Metallic Tungsten Nanostructures and Highly Nanostructured Thin Films by Deposition of Tungsten Oxide and Subsequent Reduction in a Single Hot-Wire CVD Process Chemical Vapor Deposition 18

Version of Record online: 5 MAR 2012 | DOI: 10.1002/cvde.201106955

In a single deposition process, tungsten oxide nanostructures and nanostructured thin films were deposited by Hot-Wire Chemical Vapor Deposition and subsequently reduced by atomic hydrogen at a temperature of 700 ± 100 °C. Metallic tungsten nanostructures and nanostructured thin films of varying morphology can thus controllable be obtained by this method. The metallic structures were, amongst others, characterized by scanning electron microscopy (SEM), transmission electron microscopy (TEM), and X-ray diffraction (XRD).

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