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Maria Rita Catalano, Graziella Malandrino, Roberta G. Toro and Raffaella Lo Nigro Control of Heteroepitaxial Growth of CaCu3Ti4O12 Films on SrTiO3 Substrates by MOCVD Chemical Vapor Deposition 18

Version of Record online: 5 MAR 2012 | DOI: 10.1002/cvde.201106960

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CaCu3Ti4O12 thin films have been successfully deposited by MOCVD technique on SrTiO3(001) substrates using an interesting approach based on a molten multi-component precursor source. It has been found that also in case of a relatively large lattice mismatch (∼ 5%), the epitaxial growth can be achieved by a careful optimization of deposition parameters. The kinetic and thermodynamical issues involved in the MOCVD epitaxial growth have been evaluated.

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