Curtisha D. Travis and Raymond A. Adomaitis Modeling ALD Surface Reaction and Process Dynamics using Absolute Reaction Rate Theory Chemical Vapor Deposition 19
A physically based model of ALD surface reaction dynamics is developed and applied to alumina ALD. The time-dependent growth surface composition is modeled using transition state theory. A numerical procedure is developed to distinguish saturating growth per cycle from non-saturating conditions. The transition between the two regimes is studied as a function of pressure, exposure time, and temperature.
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