Lan-Bo Di, Chuan Shi, Xiao-Song Li, Jing-Lin Liu and Ai-Min Zhu Uniformity, Structure, and Photocatalytic Activity of TiO2 Films Deposited by Atmospheric-Pressure Linear Cold Plasma Chemical Vapor Deposition 18
Atmospheric-pressure, linear, cold plasma is employed to deposit TiO2 photocatalytic films uniformly on a moving substrate. Raman, XRD, and FTIR spectra prove that the structures of the as-deposited and calcined TiO2 films are mainly hydro-oxygenated amorphous (a-TiOx:OH) and anatase, respectively. All the as-deposited TiO2 films exhibit clear photocatalytic activity in complete oxidation of HCHO to CO2.
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