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Jingchao Guan, Jianhui Jin, Xiao Chen, Bingsen Zhang, Dangsheng Su and Changhai Liang Preparation and Formation Mechanism of Highly Dispersed Manganese Silicide on Silica by MOCVD of Mn(CO)5SiCl3 Chemical Vapor Deposition 19

Article first published online: 19 FEB 2013 | DOI: 10.1002/cvde.201207009

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Uniformly dispersed MnSi nanoparticles on silica with a size of about 5–6 nm are synthesized by MOCVD of Mn(CO)5SiCl3 as a single-source precursor. The formation mechanism of MnSi from Mn(CO)5SiCl3 adsorbed on silica in H2 through elimination of carbonyl groups and dissociation of SiCl bonds is proven using in-situ FTIR spectroscopy.

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