Sanjayan Sathasivam, Andreas Kafizas, Sapna Ponja, Nicholas Chadwick, Davinder S. Bhachu, Salem M. Bawaked, Abdullah Y. Obaid, Shaeel Al-Thabaiti, Sulaiman N. Basahel, Claire J. Carmalt and Ivan P. Parkin Combinatorial Atmospheric Pressure CVD of a Composite TiO2/SnO2 Thin Film Chemical Vapor Deposition 20
Article first published online: 21 FEB 2014 | DOI: 10.1002/cvde.201307081
A TiO2/SnO2 composite film with varying amounts of TiO2 and SnO2 concentration across a single substrate is deposited using combinatorial APCVD and is fully characterized. The photocatalytic activity of the film across fifty grid points is determined using Resazurin redox dye, and the sheet resistance is studied using a four-point probe via the Van der Pauw method.
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