Zhi-Guang Sun, Xiao-Song Li, Xiaobing Zhu, Xiao-Qing Deng, Da-Lei Chang and Ai-Min Zhu Facile and Fast Deposition of Amorphous TiO2 Film under Atmospheric Pressure and at Room Temperature, and its High Photocatalytic Activity under UV-C Light Chemical Vapor Deposition 20
A facile and fast deposition of TiO2 film on a moving substrate under atmospheric pressure and at room temperature using TTIP and H2O as CVD precursors is reported for the first time. It is demonstrated that the as-deposited film is amorphous TiO2 and it is rich in surface OH groups. The as-deposited TiO2 films, on glass and PET substrates, exhibit very high photocatalytic activity for complete oxidation of HCHO to CO2 in simulated air under UV-C irradiation.
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