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S. N. Agbo, S. Dobrovolskiy, G. Wegh, R. A. C. M. M. van Swaaij, F. D. Tichelaar, P. Sutta and M. Zeman Structural analyses of seeded thin film microcrystalline silicon solar cell Progress in Photovoltaics: Research and Applications 22

Version of Record online: 26 AUG 2012 | DOI: 10.1002/pip.2274

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The use of seed layer for the radio frequency plasma-enhanced chemical vapor deposition growth of thin film microcrystalline silicon facilitates crystal nucleation and eliminates the adverse effect of amorphous silicon incubation layer. This way, it is possible to grow microcrystalline silicon of uniform crystalline volume fraction directly from a crystalline growth phase without the growth evolving through the intermediate phases.

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