E-mail

E-mail a Wiley Online Library Link

S. N. Agbo, S. Dobrovolskiy, G. Wegh, R. A. C. M. M. van Swaaij, F. D. Tichelaar, P. Sutta and M. Zeman Structural analyses of seeded thin film microcrystalline silicon solar cell Progress in Photovoltaics: Research and Applications 22

Article first published online: 26 AUG 2012 | DOI: 10.1002/pip.2274

Thumbnail image of graphical abstract

The use of seed layer for the radio frequency plasma-enhanced chemical vapor deposition growth of thin film microcrystalline silicon facilitates crystal nucleation and eliminates the adverse effect of amorphous silicon incubation layer. This way, it is possible to grow microcrystalline silicon of uniform crystalline volume fraction directly from a crystalline growth phase without the growth evolving through the intermediate phases.

Complete the form below and we will send an e-mail message containing a link to the selected article on your behalf

Required = Required Field

Choose captcha format: Image or Audio. Click here if you need help.

SEARCH