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Loic Tous, Jean-Francois Lerat, Thierry Emeraud, Razvan Negru, Karim Huet, Angel Uruena, Monica Aleman, Johan Meersschaut, Hugo Bender, Richard Russell, Joachim John, Jef Poortmans and Robert Mertens Nickel silicide contacts formed by excimer laser annealing for high efficiency solar cells Progress in Photovoltaics: Research and Applications 21

Version of Record online: 28 JAN 2013 | DOI: 10.1002/pip.2362

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In this paper, we demonstrate that by using large area (10 × 10 mm2), excimer laser annealing (ELA) self-aligned nickel silicide contacts can be formed, and subsequently, Cu plated on industrial shallow emitters without the associated junction degradation. The impact of the ELA fluence was evaluated using sheet resistance measurements, transmission electron microscopy, quasi-steady-state photo-conductance lifetime measurements, and finite element simulations. In this work, the best performing large area solar cell with the ELA process reached 20.0% energy conversion efficiency.

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