David Muñoz-Rojas, Haiyan Sun, Diana C. Iza, Jonas Weickert, Li Chen, Haiyan Wang, Lukas Schmidt-Mende and Judith L. MacManus-Driscoll High-speed atmospheric atomic layer deposition of ultra thin amorphous TiO2 blocking layers at 100 °C for inverted bulk heterojunction solar cells Progress in Photovoltaics: Research and Applications 21
The potential of a novel spatial atmospheric atomic layer deposition (AALD) system for the ultrafast, low temperature fabrication of high quality blocking layers is demonstrated. Thin (~12 nm) amorphous TiO2 films can be deposited at 100 °C in only 37 s over a 7.8 cm2 area. P3HT-PCBM-based solar cells fabricated with the AALD films show performances comparable with cells made using TiO2 films deposited with orders of magnitude longer processing times and/or higher temperatures. In addition, the novel AALD system is easily scalable and compatible with roll-to-roll processing.
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