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Tatsuaki Kasai, Tomoya Higashihara and Mitsuru Ueda A novel photo-acid generator bound molecular glass resist with a single protecting group Journal of Polymer Science Part A: Polymer Chemistry 51

Article first published online: 7 FEB 2013 | DOI: 10.1002/pola.26575

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A novel photo-acid generator (PAG) bound molecular glass photoresist with a single protecting group has been developed as a promising resist material for use in microelectronics.

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