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Anna Maria Coclite, Gozde Ozaydin-Ince, Fabio Palumbo, Antonella Milella and Karen K. Gleason Single-Chamber Deposition of Multilayer Barriers by Plasma Enhanced and Initiated Chemical Vapor Deposition of Organosilicones Plasma Processes and Polymers 7

Article first published online: 1 FEB 2010 | DOI: 10.1002/ppap.200900139

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Multilayered coatings were deposited coupling initiated chemical vapor deposition and plasma deposition in a single-chamber vacuum-based process. Such multilayers were investigated with XPS depth profiling, FEG-SEM imaging and ellipsometry. A 100-fold improvement in the barrier properties was found when depositing three C-rich/C-depleted dyads compared to a single layer. This result is ascribed to an effective defect decoupling and to the smoothing properties of the layer deposited by iCVD.

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