Anna Maria Coclite, Gozde Ozaydin-Ince, Fabio Palumbo, Antonella Milella and Karen K. Gleason Single-Chamber Deposition of Multilayer Barriers by Plasma Enhanced and Initiated Chemical Vapor Deposition of Organosilicones Plasma Processes and Polymers 7
Multilayered coatings were deposited coupling initiated chemical vapor deposition and plasma deposition in a single-chamber vacuum-based process. Such multilayers were investigated with XPS depth profiling, FEG-SEM imaging and ellipsometry. A 100-fold improvement in the barrier properties was found when depositing three C-rich/C-depleted dyads compared to a single layer. This result is ascribed to an effective defect decoupling and to the smoothing properties of the layer deposited by iCVD.
Complete the form below and we will send an e-mail message containing a link to the selected article on your behalf