Anna Maria Coclite and Karen K. Gleason Initiated PECVD of Organosilicon Coatings: A New Strategy to Enhance Monomer Structure Retention Plasma Processes and Polymers 9
Herein we show a new deposition method, initiated-PECVD (iPECVD), as an alternative to iCVD and PECVD, for the monomers that are not easily polymerizable by iCVD (e.g., the organosilicon monomers) but where a certain structure retention is needed. The addition of a radical initiator allows to ignite a plasma discharge at plasma density as low as 0.07 W · cm−2. In this condition the carbon content of the monomer molecule is completely retained and at reasonably high deposition rate.
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