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M. A. Sahiner, P. S. Lysaght, J. C. Woicik, C. S. Park, J. Huang, G. Bersuker, W. Taylor, P. D. Kirsch and R. Jammy Local structural modifications of the HfO2 layer in the Al2O3 capped high-k dielectric films as probed by EXAFS physica status solidi (a) 209

Article first published online: 22 MAR 2012 | DOI: 10.1002/pssa.201100669

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