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Taeyong Park, Dongjin Choi, Hagyoung Choi and Hyeongtag Jeon The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2 physica status solidi (a) 209

Article first published online: 15 NOV 2011 | DOI: 10.1002/pssa.201127280

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