E-mail

E-mail a Wiley Online Library Link

T. Rana, M. V. S. Chandrashekhar and T. S. Sudarshan Elimination of silicon gas phase nucleation using tetrafluorosilane (SiF4) precursor for high quality thick silicon carbide (SiC) homoepitaxy physica status solidi (a) 209

Article first published online: 7 SEP 2012 | DOI: 10.1002/pssa.201228319

Complete the form below and we will send an e-mail message containing a link to the selected article on your behalf

Required = Required Field

Choose captcha format: Image or Audio. Click here if you need help.

SEARCH