Lei Zhang, Honglie Shen and Jiayi You Effect of substrate bias on the properties of microcrystalline silicon films deposited by hot-wire chemical vapor deposition physica status solidi (a) 210
Article first published online: 20 DEC 2012 | DOI: 10.1002/pssa.201228342
Complete the form below and we will send an e-mail message containing a link to the selected article on your behalf
Required = Required Field
Choose captcha format: Image or Audio. Click here if you need help.