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R. Alvarez, P. Romero-Gomez, J. Gil-Rostra, J. Cotrino, F. Yubero, A. R. Gonzalez-Elipe and A. Palmero Growth of SiO2 and TiO2 thin films deposited by reactive magnetron sputtering and PECVD by the incorporation of non-directional deposition fluxes physica status solidi (a) 210

Version of Record online: 30 JAN 2013 | DOI: 10.1002/pssa.201228656

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