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T. Arroval, L. Aarik, R. Rammula, H. Mändar, J. Aarik, B. Hudec, K. Hušeková and K. Fröhlich Influence of growth temperature on the structure and electrical properties of high-permittivity TiO2 films in TiCl4-H2O and TiCl4-O3 atomic-layer-deposition processes physica status solidi (a) 211

Version of Record online: 16 SEP 2013 | DOI: 10.1002/pssa.201330086

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