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Bongmook Lee, Casey Kirkpatrick, Young-hwan Choi, Xiangyu Yang, Alex Q. Huang and Veena Misra Normally-off AlGaN/GaN MOSHFET using ALD SiO2 tunnel dielectric and ALD HfO2 charge storage layer for power device application physica status solidi (c) 9

Version of Record online: 29 FEB 2012 | DOI: 10.1002/pssc.201100422

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