Shang-Ying Wu, Yun-Min Lee, Jong-Shinn Wu and Ming-Chang Lin Ab initio chemical kinetics for the unimolecular decomposition of Si2H5 radical and related reverse bimolecular reactions International Journal of Quantum Chemistry 114
Fundamental modeling of fluid dynamics and chemical reaction mechanisms is often required for the understanding of complex chemical processes occurring inside the chemical vapor deposition (CVD) chamber. The disilanyl radical (Si2H5) inside the CVD chamber is a potential reactive intermediate involved in several reactions of interest. Critical data on the kinetics and mechanisms for Si2H5 thermal decomposition and the related bimolecular reactions are presented.
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