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Antony George, S. Mathew, Raoul van Gastel, Maarten Nijland, K. Gopinadhan, Peter Brinks, T. Venkatesan and Johan E. ten Elshof Large Area Resist-Free Soft Lithographic Patterning of Graphene Small 9

Article first published online: 19 NOV 2012 | DOI: 10.1002/smll.201201889

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Large area low-cost patterning is a challenging problem in graphene research. A resist-free, single-step, large area and cost effective soft lithographic patterning strategy is presented for graphene. The technique is applicable on any arbitrary substrate that needs to be covered with a graphene film and provides a viable route to large-area patterning of graphene for device applications.

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