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Sarah Kim, Dong Ok Shin, Dae-Geun Choi, Jong-Ryul Jeong, Jeong Ho Mun, Yong-Biao Yang, Jaeup U. Kim, Sang Ouk Kim and Jun-Ho Jeong Nanopatterning: Graphoepitaxy of Block-Copolymer Self-Assembly Integrated with Single-Step ZnO Nanoimprinting (Small 10/2012) Small 8

Version of Record online: 14 MAY 2012 | DOI: 10.1002/smll.201290057

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The cover image features a highly efficient nanolithography technique with a minimal number of processing steps, integrating directed block-copolymer self-assembly with single-step ZnO nanoimprinting. Diverse shapes of the ZnO patterns are readily attainable by UV-assisted, single-step imprinting of sol–gel precursors. The ZnO provides high thermal stability and low line-edge roughness, both of which are crucial for further directed blockcopolymer assembly. According to the ZnO trench shape, various self-assembled nanoscale morphologies—such as surface-parallel nanocylinder arrays, hierarchical nanopatterns of surface-parallel and vertical cylinder arrays, and co-axial nano-ring arrays—can be formed in the graphoepitaxially assembled block-copolymer thin films. For more information, please read the Full Paper “Graphoepitaxy of Block-Copolymer Self-Assembly Integrated with Single-Step ZnO Nanoimprinting” by S. O. Kim, J.-H. Jeong, and co-workers, beginning on page 1563.

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