European Journal of Inorganic Chemistry

Cover image for Vol. 2017 Issue 19

Editor: Karen Hindson, Deputy Editor: Preeti Vashi

Impact Factor: 2.686

ISI Journal Citation Reports © Ranking: 2015: 12/46 (Chemistry Inorganic & Nuclear)

Online ISSN: 1099-0682

Associated Title(s): Angewandte Chemie International Edition, Chemistry - A European Journal, Chemistry – An Asian Journal, ChemistryOpen, ChemCatChem, Zeitschrift für anorganische und allgemeine Chemie

2014_06/2014Organic–Inorganic Thin Films from TiCl4 and 4-Aminophenol Precursors: A Model Case of ALD/MLD Hybrid-Material Growth? (Eur. J. Inorg. Chem. 6/2014)

The cover picture shows the deposition cycle of a (Ti–O–C6H4–N=)n-type thin film with TiCl4 and 4-aminophenol as precursors. The atomic/molecular layer-by-layer growth process is carried out by employing a combination of the atomic and molecular layer deposition (ALD/MLD) techniques. The combined ALD/MLD technique provides a powerful tool to fabricate organic–inorganic hybrid thin films with versatile structures. Details are discussed in the article by P. Sundberg and M. Karppinen on p. 968 ff. For more on the story behind the cover research, see the Cover Profile.

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