Chemical Vapor Deposition
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Online ISSN: 1521-3862
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Recently Published Articles
- Titanium Dioxide Thin Films Deposited by Electric Field-Assisted CVD: Effect on Antimicrobial and Photocatalytic Properties
Luz Romero, Clara Piccirillo, Paula M. L. Castro, Christopher Bowman, Michael E. A. Warwick and Russell Binions
Article first published online: 7 JAN 2015 | DOI: 10.1002/cvde.201407145
Thin films of titanium dioxide are deposited via electric field-assisted aerosol CVD. The application of electric fields in the deposition leads to the production of highly oriented thin films that are demonstrated to have significantly enhanced dye degradation and antibacterial properties when compared to a film deposited without the application of electric fields.
- Aerosol-Assisted CVD of Bismuth Vanadate Thin Films and Their Photoelectrochemical Properties
Paul Brack, Jagdeep S. Sagu, T. A. Nirmal Peiris, Andrew McInnes, Mauro Senili, K. G. Upul Wijayantha, Frank Marken and Elena Selli
Article first published online: 7 JAN 2015 | DOI: 10.1002/cvde.201407142
Thin film bismuth vanadate (BiVO4) photoelectrodes are prepared by AACVD for the first time on fluorine-doped tin oxide (FTO) glass substrates. The photoelectrochemical (PEC) properties of the BiVO4 photoelectrodes are studied in aqueous 1 M Na2SO4 and show photocurrent densities of 0.4 mA cm−2 and a maximum incident-photon-to-electron conversion efficiency (IPCE) of 19% at 1.23 V vs. RHE. BiVO4 photoelectrodes prepared by this method are highly promising for use in PEC water-splitting cells.
- 3D CFD Simulations: Effect of Operation Parameters on the Deposition of Photocatalytic TiO2 Nanoparticles by MOCVD
Siti Hajar Othman, Suraya Abdul Rashid, Tinia Idaty Mohd. Ghazi and Norhafizah Abdullah
Article first published online: 7 JAN 2015 | DOI: 10.1002/cvde.201407127
A 3D computational fluid dynamics (CFD) simulation investigation on the effect of imperative operation parameters (deposition temperature between 500 and 900 °C and carrier-gas flow rate between 0.2 and 0.6 slm) was performed on the deposition of photocatalytic TiO2 nanoparticles by metal-organic (MO)CVD. Surface deposition rate, and hence the amount of nanoparticles produced, increased with the increase in deposition temperature and decrease in carrier-gas flow rate.
- AACVD of Molybdenum Sulfide and Oxide Thin Films From Molybdenum(V)-based Single-source Precursors
Nicky Savjani, Jack R. Brent and Paul O'Brien
Article first published online: 7 JAN 2015 | DOI: 10.1002/cvde.201407135
Dithiocarbamate- and xanthate-bearing oxo-molybdenum complex single-source precursors (SSPs) are subjected to AACVD. The deposition of molybdenum sulfide or oxide thin films is found to depend on the ligand system within Mo2O3(L)4 (where L = S2CNEt2 or S2COEt), and allows the investigation of the decomposition pathways of the two complexes.
- Growth of a Carbon Micro- and Nanocoils Mixture using NiSO4 as the Catalyst Precursor
Ruixue Cui, Dawei Li, Xin Fu, Muhammad Asif and Lujun Pan
Article first published online: 2 JAN 2015 | DOI: 10.1002/cvde.201407144
A mixture of carbon micro- and nanocoils (CMCs/CNCs) was synthesized by catalytic pyrolysis of acetylene at 650 °C using NiSO4. Results indicate that generally CMCs are in double-helical form, while most grown CNCs are in twisted single-helical form. Raman spectra indicate that the real active catalyst precursor for growing CMCs/CNCs is NiSO4, while NiO is not effective.