Chemical Vapor Deposition

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Online ISSN: 1521-3862

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  1. ITO-induced Columnar Polycrystalline Silicon Thin Films by CVD**

    Jun Du, Xin Gu, Huaqiang Fu, Haizhi Guo, Jiao Liu, Qi Wu and Jianguo Zou

    Article first published online: 12 MAR 2015 | DOI: 10.1002/cvde.201407138

    CVD is used to prepare ITO-induced polycrystalline silicon thin films with SiH4 as the precursor. The growth of columnar polycrystalline silicon is demonstrated. The sheet resistance of the films ranges from about 167.3 to 466.2 Ω/sq. Light absorption increases, as does the detected transmittance, by about 18.4% − 30.5% for wavelengths less than 500 − 700 nm.

  2. CFD Simulations of Hydrodynamics of Conical Spouted Bed Nuclear Fuel Coaters

    Senem Şentürk Lüle, Uner Colak, Murat Koksal and Gorkem Kulah

    Article first published online: 2 MAR 2015 | DOI: 10.1002/cvde.201407150

    Thumbnail image of graphical abstract

    CFD simulations of conical spouted beds operated with high density (6050 kg m−3) particles are performed using two fluid method (TFM). The modelling capability of the TFM approach is investigated by comparing simulation and experimental results. Contours of the solid volume fraction from CFD simulation (a) and a snapshot from experiment (b) show similar gas-solid flow pattern.

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    Titanium Dioxide Thin Films Deposited by Electric Field-Assisted CVD: Effect on Antimicrobial and Photocatalytic Properties** (pages 63–70)

    Luz Romero, Clara Piccirillo, Paula M. L. Castro, Christopher Bowman, Michael E. A. Warwick and Russell Binions

    Article first published online: 7 JAN 2015 | DOI: 10.1002/cvde.201407145

    Thumbnail image of graphical abstract

    Thin films of titanium dioxide are deposited via electric field-assisted aerosol CVD. The application of electric fields in the deposition leads to the production of highly oriented thin films that are demonstrated to have significantly enhanced dye degradation and antibacterial properties when compared to a film deposited without the application of electric fields.

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    Aerosol-Assisted CVD of Bismuth Vanadate Thin Films and Their Photoelectrochemical Properties (pages 41–45)

    Paul Brack, Jagdeep S. Sagu, T. A. Nirmal Peiris, Andrew McInnes, Mauro Senili, K. G. Upul Wijayantha, Frank Marken and Elena Selli

    Article first published online: 7 JAN 2015 | DOI: 10.1002/cvde.201407142

    Thumbnail image of graphical abstract

    Thin film bismuth vanadate (BiVO4) photoelectrodes are prepared by AACVD for the first time on fluorine-doped tin oxide (FTO) glass substrates. The photoelectrochemical (PEC) properties of the BiVO4 photoelectrodes are studied in aqueous 1 M Na2SO4 and show photocurrent densities of 0.4 mA cm−2 and a maximum incident-photon-to-electron conversion efficiency (IPCE) of 19% at 1.23 V vs. RHE. BiVO4 photoelectrodes prepared by this method are highly promising for use in PEC water-splitting cells.

  5. 3D CFD Simulations: Effect of Operation Parameters on the Deposition of Photocatalytic TiO2 Nanoparticles by MOCVD

    Siti Hajar Othman, Suraya Abdul Rashid, Tinia Idaty Mohd. Ghazi and Norhafizah Abdullah

    Article first published online: 7 JAN 2015 | DOI: 10.1002/cvde.201407127

    A 3D computational fluid dynamics (CFD) simulation investigation on the effect of imperative operation parameters (deposition temperature between 500 and 900 °C and carrier-gas flow rate between 0.2 and 0.6 slm) was performed on the deposition of photocatalytic TiO2 nanoparticles by metal-organic (MO)CVD. Surface deposition rate, and hence the amount of nanoparticles produced, increased with the increase in deposition temperature and decrease in carrier-gas flow rate.

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