Chemical Vapor Deposition
Copyright © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Online ISSN: 1521-3862
Materials Science Weekly Newsletter
Recently Published Articles
- Investigation of Optical, Electrical, and Mechanical Properties of MOCVD-grown ZrO2 Films (pages 320–327)
Van-Son Dang, Manish Banerjee, Huaizhi Zhu, Nagendra Babu Srinivasan, Harish Parala, Janine Pfetzing-Micklich, Andreas D. Wieck and Anjana Devi
Article first published online: 1 SEP 2014 | DOI: 10.1002/cvde.201407124
Full Paper: ZrO2 thin films are deposited by metal-organic (MO)CVD using the precursor (Zr(NMe2)2(guan)2) as the Zr source, together with oxygen. Functional properties, including the optical, electrical, and mechanical properties, of the resulting ZrO2 films are investigated.
- Focused Electron Beam-Induced CVD of Iron: a Practical Guide for Direct Writing (pages 243–250)
Marco Gavagnin, Heinz D. Wanzenboeck, Mostafa M. Shawrav, Domagoj Belic, Stefan Wachter, Simon Waid, Michael Stoeger–Pollach and Emmerich Bertagnolli
Article first published online: 20 AUG 2014 | DOI: 10.1002/cvde.201407118
Full Paper: Focused electron beam-induced deposition (FEBID) is used as a direct-write approach for the fabrication of Fe-based nanostructures on Si(100), starting from Fe(CO)5. FEBID uses an electron beam to locally induce a CVD process. A systematic variation of FEBID parameters is performed to study their influence on the geometry and composition of the deposit. Based on the results, specific deposition conditions are suggested for nanomagnetic applications and the fabrication of large structures.
- Electron Beam-Induced CVD of Nanoalloys for Nanoelectronics (pages 251–257)
Mostafa Moonir Shawrav, Domagoj Belić, Marco Gavagnin, Stefan Wachter, Markus Schinnerl, Heinz D. Wanzenboeck and Emmerich Bertagnolli
Article first published online: 19 AUG 2014 | DOI: 10.1002/cvde.201407119
Full Paper: Focused electron beam-induced deposition is utilized to co-deposit gold and iron structures using dimethyl-gold(III)-trifluoroacetylacetonate and iron pentacarbonyl metal-organic precursors. The deposition rate and chemical composition of these direct-write Au-Fe nanoalloys can be controlled by varying the working pressures.
- Plasma-Assisted Atomic Layer Deposition of PtOx from (MeCp)PtMe3 and O2 Plasma (pages 258–268)
Ivo J. M. Erkens, Marcel A. Verheijen, Harm C. M. Knoops, Tatiana F. Landaluce, Fred Roozeboom and Wilhelmus M. M. Kessels
Article first published online: 6 AUG 2014 | DOI: 10.1002/cvde.201407109
Thin films and nanoparticles of PtOx (2.5 < x < 2.7) are deposited by plasma-assisted ALD in a temperature window from room temperature to 300°C by controlling the O2 plasma and (MeCp)PtMe3 exposure. With increasing substrate temperature, the thermal stability of PtOx is found to decrease and the reducing activity of the precursor ligands is found to increase. The material properties of the PtOx films are studied and it is shown that a film conformality of 90% can be achieved in trenches with an aspect ratio of 9.