Chemical Vapor Deposition
Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Online ISSN: 1521-3862
Recently Published Articles
- A Micro-pulse Process of Atomic Layer Deposition of Iron Oxide Using Ferrocene and Ozone Precursors and Ti-Doping
Xianglin Li, Ng Chin Fan and Hong Jin Fan
Article first published online: 16 MAY 2013 | DOI: 10.1002/cvde.201207030
A micro-pulse ALD process is developed for fast deposition of Fe2O3 on both planar and high aspect ratio substrates (nanowires and AAO channels). By introducing TiO2 co-deposition, a linear growth rate can be maintained up to 600 cycles, corresponding to a thickness of 33 nm. A controllable Ti-doping into Fe2O3 films is achievable by adjusting the ALD cycle ratios of TiO2 and Fe2O3.
- Atomic Layer Deposition of Al-doped ZnO Films Using Aluminum Isopropoxide as the Al Precursor
Xu Qian, Yanqiang Cao, Binglei Guo, Haifa Zhai and Aidong Li
Article first published online: 16 MAY 2013 | DOI: 10.1002/cvde.201207051
Al-doped ZnO (AZO) films are deposited by atomic layer deposition (ALD) on borosilicate glass and Si using diethylzinc and aluminum isopropoxide as Zn and Al precursors, respectively. The effects of Zn/Al ALD cycle ratio and the Al source temperature on the Al dopant concentration and resistivity of AZO films are investigated. The AZO films deposited at an Al source temperature of 120°C show the lowest resistivity.
- Molecular Hybrid Structures by Atomic Layer Deposition – Deposition of Alq3, Znq2 and Tiq4 (q = 8-hydroxyquinoline)
Ola Nilsen, Kristoffer Robin Haug, Terje Finstad and Helmer Fjellvåg
Article first published online: 16 MAY 2013 | DOI: 10.1002/cvde.201207043
Thin films of metal quinolines based on 8-hydroxyquinoline (q) and aluminum (Alq3), zinc (Znq2), and titanium (possibly Tiq4) are deposited using ALD in the temperature range 85–200 °C. This demonstrates the ALD growth of structures based on weak Van der Waals forces. The Alq3 material proves stable towards exposure to water during deposition. Films of both Alq3 and Znq2 are significantly photoluminescent active.
- Influence of Subsurface Hybrid Material Growth on the Mechanical Properties of Atomic Layer Deposited Thin Films on Polymers
Yujie Sun, Richard P. Padbury, Halil I. Akyildiz, Matthew P. Goertz, Jeremy A. Palmer and Jesse S. Jur
Article first published online: 16 MAY 2013 | DOI: 10.1002/cvde.201207042
The mechanical properties of Al2O3 ALD coatings on polyamide 6 are examined by nano-indentation and flexure testing to determine the influence of a sub-surface hybrid layer formed during the ALD process. The results show the importance of the consideration of this hybrid layer on the use of these materials in future flexible electronic and encapsulation applications.
- Photocatalytic Properties of WO3/TiO2 Core/Shell Nanofibers prepared by Electrospinning and Atomic Layer Deposition
Imre Miklós Szilágyi, Eero Santala, Mikko Heikkilä, Viljami Pore, Marianna Kemell, Timur Nikitin, Georg Teucher, Tamás Firkala, Leonid Khriachtchev, Markku Räsänen, Mikko Ritala and Markku Leskelä
Article first published online: 16 MAY 2013 | DOI: 10.1002/cvde.201207037
TiO2 thin films (1.5–20 nm) are grown by ALD on electrospun WO3 nanofibers. The WO3/1.5 nm TiO2 composite nanofiber has the highest photocatalytic activity, and it is a better photocatalyst under visible light when compared to bare WO3 and Degussa TiO2.