Chemical Vapor Deposition

Cover image for Vol. 20 Issue 10-11-12

Online ISSN: 1521-3862

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Recently Published Articles

  1. Barrier Strain and Carbon Incorporation-Engineered Performance Improvements for AlGaN/GaN High Electron Mobility Transistors**

    Tien Tung Luong, Yen Teng Ho, Binh Tinh Tran, Yuen Yee Woong and Edward Yi Chang

    Article first published online: 18 DEC 2014 | DOI: 10.1002/cvde.201407100

    The performance improvement for AlGaN/GaN HEMTs grown using MOCVD by engineering structure, barrier strain, and unintentional carbon incorporation are demonstrated. Utilizing an AlN interlayer introduces a reduction of AlGaN barrier tensile strain, which results in a remarkable increase of the 2DEG mobility. The leakage current improves significantly by optimizing the design of the buffer layer and modifying the growth parameters.

  2. Growth and Properties of Amorphous Erbium-doped Aluminum-yttrium Oxide Films Deposited by Aerosol-UV-Assisted MOCVD

    Rached Salhi, Carmen Jimenez, Jean-Luc Deschanvres, Ramzi Maâlej and Mohieddine Fourati

    Article first published online: 24 NOV 2014 | DOI: 10.1002/cvde.201407068

    Erbium doped yttrium-aluminum oxide films are deposited by AA-MOCVD. The effects on their structure and optical properties of humidity of carrier gas and UV assistance during the deposition are investigated as a function of the substrate temperature. The effect of composition is studied at substrate temperature of 410 °C. The effect on film composition when varying the aluminum mole fraction in the liquid solution was studied.

  3. Highly Photocatalytically Active Iron(III) Titanium Oxide Thin films via Aerosol-Assisted CVD

    Sanjayan Sathasivam, Davinder S. Bhachu, Yao Lu, Salem M. Bawaked, Abdullah Y. Obaid, Shaeel Al-Thabaiti, Sulaiman N. Basahel, Claire J. Carmalt and Ivan P. Parkin

    Article first published online: 20 NOV 2014 | DOI: 10.1002/cvde.201407143

    Thumbnail image of graphical abstract

    This paper reports the synthesis of Fe2TiO5 thin films from the AACVD of titanium isopropoxide and tris(acetylacetonato)iron in ethyl acetate. Phase-pure Fe2TiO5 was obtained after post-deposition annealing in air at 620 °C. The films showed enhanced photocatalytic properties compared to, and with a FQE in the destruction of resazurin redox dye an order of magnitude greater than, Pilkington ActivTM.

  4. Initiated CVD of Tertiary Amine-Containing Glycidyl Methacrylate Copolymer Thin Films for Low Temperature Aqueous Chemical Functionalization (pages 373–379)

    Fatma Sarıipek and Mustafa Karaman

    Article first published online: 24 OCT 2014 | DOI: 10.1002/cvde.201407129

    Initiated CVD is used for the synthesis of copolymer films of glycidyl methacrylate (GMA) with diethylaminoethyl methacrylate (DEAEMA). The use of initiator allows high deposition rates at low filament temperatures. A tertiary amine functional group incorporated in the PGMA film acts as a catalyst for the nucleophilic ring-opening reaction of epoxide. iCVD-grown copolymer thin films show improved reactivity towards an aqueous solution of aniline at room temperature.

  5. Coating of Alumina Fibres With Aluminium Phosphate by a Continuous Chemical Vapour Deposition Process (pages 388–398)

    Sabine Stöckel, Susann Ebert, Maike Böttcher, Andreas Seifert, Thomas Wamser, Walter Krenkel, Steffen Schulze, Michael Hietschold, Helmut Gnaegi and Werner A. Goedel

    Article first published online: 20 OCT 2014 | DOI: 10.1002/cvde.201407099

    Aluminium phosphate layers are generated on the surface of alumina fibres by exposing them to gas mixtures of phosphoryl trichloride and oxygen. Ceramic-matrix composites made by embedding these coated fibres into an alumina matrix show improved fibre pull-out. Thus, the coated fibres may be promising as reinforcing fibres of advanced inorganic composites qualified for operating temperatures up to 1200 °C.