Chemical Vapor Deposition

Cover image for Vol. 21 Issue 7-8-9

Online ISSN: 1521-3862

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Recently Published Articles

  1. Phase-selective Route to V-O Film Formation: A Systematic MOCVD Study Into the Effects of Deposition Temperature on Structure and Morphology

    Simon F. Spanò, Roberta G. Toro, Guglielmo G. Condorelli, Grazia M. L. Messina, Giovanni Marletta and Graziella Malandrino

    Article first published online: 23 NOV 2015 | DOI: 10.1002/cvde.201507186

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    A systematic study is carried out into the MOCVD of V-O films using the vanadyl-acetylacetonate precursor on a Si(001) substrate. XRD data point to the formation of crystalline films in the range 200–550 °C, with different phases forming within the investigated range.

  2. CVD Deposited Titania Thin Films for Gas Sensors with Improved Operating Characteristics

    Marina V. Baryshnikova, Leonid A. Filatov, Andrey S. Petrov and Sergey E. Alexandrov

    Article first published online: 23 NOV 2015 | DOI: 10.1002/cvde.201507187

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    An experimental evaluation of TiO2 thin films formed by CVD as active layers in semiconductor, resistive sensors for detection of ethanol vapors. Sensors produced on the basis of titania films containing the highest amount of anatase phase and with the lowest grain size (a typical SEM image is shown) are characterized by highest values of response and shortest response-recovery times.

  3. Uniform Coating of Microparticles using CVD Polymerization

    Yu Liang, Jacob H. Jordahl, Hao Ding, Xiaopei Deng and Joerg Lahann

    Article first published online: 23 NOV 2015 | DOI: 10.1002/cvde.201507197

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    A custom-designed fluidized bed reactor is attached to the outlet of a CVD polymerization system, thereby imparting chemical functionality on the surface of microparticles. Functional polymer films are shown to fully coat the 3D surface of particles. This technique, in concert with metal deposition, produces Janus particles. These coated particles have a wide range of potential uses in biotechnology.

  4. Metal-organic CVD of Y2O3 Thin Films using Yttrium tris-amidinates

    Sarah Karle, Van-Son Dang, Marina Prenzel, Detlef Rogalla, Hans-Werner Becker and Anjana Devi

    Article first published online: 19 NOV 2015 | DOI: 10.1002/cvde.201507189

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    Y2O3 thin films are grown by MOCVD at 400–700 °C using yttrium amidinate presursors in the presence of oxygen. The films, which are polycrystalline in case of deposition temperatures > 400 °C, are dense and exhibit good purity and homogeneity.

  5. Numerical Modeling of the Droplet Vaporization for Design and Operation of Liquid-pulsed CVD

    Raphaël Boichot and Susan Krumdieck

    Article first published online: 19 NOV 2015 | DOI: 10.1002/cvde.201507191

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    The pulsed pressure CVD process using a liquid precursor droplet spray is assessed by numerical simulation. The main parameters impacting the vaporization time of the liquid droplet cloud are the enthalpies of vaporization and vapor pressures of the compounds in the mixture, the initial temperature and size of the droplets, and the temperature of the reactor wall.