Chemical Vapor Deposition
Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Online ISSN: 1521-3862
Recently Published Articles
- Potential of Hexyl Acrylate Monomer as an Initiator in Photo-initiated CVD
Aravind Suresh, Daniel Anastasio and Daniel D. Burkey
Article first published online: 20 NOV 2013 | DOI: 10.1002/cvde.201304322
The potential of hexyl acrylate as an initiator in photo-initiated (pi) CVD is explored by demonstrating its auto-polymerization under ultraviolet (UV) radiation of wavelength 254 nm. Deposition of poly(hexyl acrylate) films on silicon substrates proceeds at high rates, approaching 1.7 µm min−1, at a stage temperature of 12.1°C, and the process is observed to be adsorption controlled.
- Facile and Fast Deposition of Amorphous TiO2 Film under Atmospheric Pressure and at Room Temperature, and its High Photocatalytic Activity under UV-C Light
Zhi-Guang Sun, Xiao-Song Li, Xiaobing Zhu, Xiao-Qing Deng, Da-Lei Chang and Ai-Min Zhu
Article first published online: 18 NOV 2013 | DOI: 10.1002/cvde.201307088
A facile and fast deposition of TiO2 film on a moving substrate under atmospheric pressure and at room temperature using TTIP and H2O as CVD precursors is reported for the first time. It is demonstrated that the as-deposited film is amorphous TiO2 and it is rich in surface OH groups. The as-deposited TiO2 films, on glass and PET substrates, exhibit very high photocatalytic activity for complete oxidation of HCHO to CO2 in simulated air under UV-C irradiation.
- Design Strategies for Reduced-Scale Surface Composition Gradients via CVD Copolymerization
Yaseen Elkasabi, Aftin M. Ross, Jonathan Oh, Michael P. Hoepfner, H. Scott Fogler, Joerg Lahann and Paul H. Krebsbach
Article first published online: 18 NOV 2013 | DOI: 10.1002/cvde.201307057
A method for depositing reduced-scale polymer surface composition gradients is described. The method applies to both flat and three-dimensional substrates. A transport model fits the experimental measurements to physical parameters, enabling the calculation of gradient properties.
- Substrate-thickness Dependence of Hydrogenated Microcrystalline Silicon Nucleation Rate on Amorphous Silicon Layer
Zewen Zuo, Guanglei Cui, Yu Wang, Junzhuan Wang, Lin Pu and Yi Shi
Article first published online: 12 NOV 2013 | DOI: 10.1002/cvde.201307003
The nucleation rate of µc-Si is dependent on the thickness of the a-Si:H layer and can be correlated with the stress inside the a-Si:H layer. a) The a-Si layer on glass initially grows in a 2D mode with a high interfacial stress inside, while b) the growth mode turns to S-K mode with increasing thickness, allowing for the interfacial stress to be relaxed through the formation of islands.
- Growth-rate Enhancement of High-quality, Low-loss CVD-produced Diamond Disks Grown for Microwave Windows Application
Sergey Bogdanov, Anatoly Vikharev, Aleksei Gorbachev, Anatoly Muchnikov, Dmitry Radishev, Nikolai Ovechkin and Vladimir Parshin
Article first published online: 12 NOV 2013 | DOI: 10.1002/cvde.201307058
The effect of nitrogen addition on the MPACVD synthesis of polycrystalline diamond is investigated with the aim of growth-rate enhancement of high-quality, low-loss CVD-produced diamond disks. Experiments are performed at microwave power densities of 40 and 110 W cm-3 using a 2.45 GHz microwave reactor. The amount of added nitrogen needed to grow CVD disks of high quality (suitable for application in microwave windows) 2.5 times faster compared with the nitrogen-free synthesis, is determined.