Chemical Vapor Deposition

Cover image for Vol. 20 Issue 4-5-6

Online ISSN: 1521-3862

Scientific Editor:Michael L. Hitchman
Associate Scientific Editor:Anthony C. Jones
Publishing Editor:Peter Gregory
Editorial Advisory Board:S. E. Alexandrov, St. Petersburg
M. Allendorf, Sandia Natl. Labs.
C. Bernard, Grenoble
T. M. Besmann, Oak Ridge Natl. Lab.
J.-O. Carlsson, Uppsala
K. H. Dahmen, Tallahassee
D. Davazoglou, Inst. Microelectronics, Athens
A. Figueras, Barcelona
R. A. Fischer, Bochum
I. Fragala, Catania
W. L. Gladfelter, Minnesota
P. John, Heriot Watt
A. Kaul, Moscow State Univ.
C. R. Kleijn, Delft
B. Lux, Vienna
T. Mäntylä, Tampere
T. Marks, Northwestern
B. S. Meyerson, IBM
S. Oda, Tokyo
G. B. Stringfellow, Utah
M. L. Terranova, Tor Vergata, Rome
G. Wahl, Braunschweig
A. M. Wrobel, Lodz

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