Chemical Vapor Deposition
Copyright © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Online ISSN: 1521-3862
Materials Science Weekly Newsletter
Recently Published Articles
- Catalyst-free Growth Mechanism and Structure of Graphene-like Nanosheets Formed by Hot-Filament CVD
Biben Wang, Kun Zheng, Qijin Cheng, Li Wang, Chengcheng Chen and Guobo Dong
Article first published online: 30 JUN 2014 | DOI: 10.1002/cvde.201407105
Graphene-like nanosheets free of catalyst are grown on silicon substrates in a hot-filament (HF)CVD system, in which the silicon substrates are deposited with carbon film and nanodots by plasma-enhanced HFCVD. During the growth of graphene-like nanosheets, methane, with flow rates of 20, 50, and 70 sccm, is employed to synthesize the graphene-like nanosheets.
- Modification and Resonance Tuning of Optical Microcavities by Atomic Layer Deposition (pages 103–111)
Jiao Wang, Gaoshan Huang and Yongfeng Mei
Article first published online: 5 JUN 2014 | DOI: 10.1002/cvde.201300054
Various optical microcavities, such as photonic crystals, opals, and tubular microcavities, are illustrated to demonstrate their development under the assistance of atomic layer deposition (ALD) technology. The ALD process presents several advantages for the fabrication and modification of optical nano-/microdevices because of its atomic level thickness fine-tuning and perfect coating conformability in complex 3D structures.
- CO2-Laser Flash Evaporation as Novel CVD Precursor Delivery System for Functional Thin Film Growth (pages 152–160)
Christoph Loho, Azad J. Darbandi, Ruzica Djenadic, Oliver Clemens and Horst Hahn
Article first published online: 16 MAY 2014 | DOI: 10.1002/cvde.201307089
A novel approach to deliver solid precursors with low volatility in a CVD process is introduced. Using CO2-laser flash evaporation of metal β-diketonates, thin films of LiCoO2 are grown under various processing conditions. It is shown that this CO2-laser-assisted CVD method enables the highly controlled growth of a multicomponent thin film with desired composition and stoichiometry over the entire growth period.
- Thermal- and Plasma-Enhanced Copper Film Deposition via a Combined Synthesis-Transport CVD Technique (pages 170–176)
Maxim S. Polyakov, Aram M. Badalyan, Vasiliy V. Kaichev and Igor K. Igumenov
Article first published online: 8 MAY 2014 | DOI: 10.1002/cvde.201307078
Combined synthesis-transport (CST) is a recently developed technique for modifying well-known MOCVD and PECVD technology. The films formed represent metallic layers with a smooth uniform surface, crystalline structure, and low thickness. The effect of plasma activation results in a two-fold decrease in the average grain size as compared to that inherent in thermal activation ceteris paribus. A general mechanism for CST is suggested.
- CVD of Pt(C5H9)2 to Synthesize Highly Dispersed Pt/SBA-15 Catalysts for Hydrogenation of Chloronitrobenzene (pages 146–151)
Manman Jiang, Mingming Zhang, Chuang Li, Christopher T. Williams and Changhai Liang
Article first published online: 2 MAY 2014 | DOI: 10.1002/cvde.201307091
Pt(C5H9)2 is synthesized by the reaction of dichloro(1,5-cyclooctadiene)platinum with pent-4-en-1-ylmagnesium bromide under inert atmosphere, and is used as a metal-organic precursor. Highly dispersed Pt/SBA-15 catalysts, with an average particle size of 4.6 ± 1.1 nm, are successfully prepared by the MOCVD of Pt(C5H9)2. These catalysts show an efficient activity for selective hydrogenation of o-CNB.